Friday, October 5, 2012

1210.1344 (M. Kimura et al.)

A new method to correct deformations in emulsion using a precise
photomask
   [PDF]

M. Kimura, H. Ishida, H. Shibuya, S. Ogawa, T. Matsuo, C. Fukushima, G. Takahashi, K. Kuge, Y. Sato, I. Tezuka, S. Mikado
A new method to correct the emulsion deformation, mainly produced in the development process, is developed to recover the high accuracy of nuclear emulsion as a tracking device. The method is based on a precise photomask and a careful treatment of the emulsion films. A position measurement accuracy of 0.6 {\mu}m is obtained over an area of 5 cm x 7 cm. The method allows to measure positions of track segments with submicron accuracy in an ECC brick with as few as 10 reference tracks for alignment. Such a performance can be important for hybrid emulsion experiments at underground laboratories where only a small number of reference tracks for alignment are available.
View original: http://arxiv.org/abs/1210.1344

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